Oct 2016 | Research Library, Posters, Diagnostics, Fusion Energy, Fusion Research, Fusion Science, Fusion Technology, Overview, Plasma Research
October 2016 | Matt Thompson | APS-DPP | Poster
TAE Technologies (TAE) seeks to study the evolution of advanced beam-driven field reversed configuration (FRC) plasmas sustained and heated by neutral beam (NB) injection.
Oct 2016 | Performance, Presentations, Fusion Energy, Fusion Research, Fusion Science, Fusion Technology, Plasma Research, Research Library
October 2016 | Artem Smirnov and Richard Magee | APS-DPP | Presentation
Provide fast learning cycles and large experimental dataset. Demonstrate sustainment via Neutral Beam Injection for > 5ms with high repeatability.
Oct 2016 | Research Library, Posters, Diagnostics, Experiment, Fusion Energy, Fusion Research, Fusion Science, Fusion Technology, Plasma Research
October 2016 | D. Sheftman | APS-DPP | Poster
Experiments demonstrating sustainment of field-reversed configuration (FRC) plasmas via neutral beam injection have been carried out on C-2U.
Oct 2016 | Research Library, Posters, Diagnostics, Experiment, Fusion Energy, Fusion Research, Fusion Science, Fusion Technology, Plasma Research
October 2016 | Kan Zhai | APS-DPP | Poster
C-2W is an upgraded experiment from C-2U and is now under construction at TAE for parameters ramping up with higher plasma temperature and longer plasma time.
Oct 2016 | Research Library, Posters, Diagnostics, Experiment, Fusion Energy, Fusion Research, Fusion Science, Fusion Technology, Plasma Research
October 2016 | Dima Osin | APS-DPP | Poster
Upgraded interferometer/polarimeter on center plane of machine to provide high resolution density and magnetic field information.
Oct 2016 | Research Library, Posters, Experiment, Fusion Energy, Fusion Research, Fusion Science, Fusion Technology, Plasma Research, Transport
October 2016 | Erik Trask | APS-DPP | Poster
Upgrades of the experimental facility at TAE Technologies have led to record Field Reversed Configuration (FRC) performance on the C-2U device.